Thermal characterization of GaN-based laser diodes by forward-voltage method
H. B. Wang(王怀兵); J. P. Liu(刘建平); S. M. Zhang(张书明); H. Yang(杨辉)
刊名Journal of Applied Physics
2012-05-01
卷号111期号:9页码:094513
通讯作者M. X. Feng(冯美鑫)
英文摘要
An expression of the relation between junction temperature and forward voltage common for both GaN-based laser diodes (LDs) and light emitting diodes is derived. By the expression, the junction temperature of GaN-based LDs emitting at 405 nm was measured at different injection current and compared with the result of micro-Raman spectroscopy, showing that the expression is reasonable. In addition, the activation energy of Mg in AlGaN/GaN superlattice layers is obtained based on the temperature dependence of forward voltage.
收录类别SCI
语种英语
WOS记录号WOS:000304109900147
公开日期2013-01-16
内容类型期刊论文
源URL[http://58.210.77.100/handle/332007/915]  
专题苏州纳米技术与纳米仿生研究所_纳米器件及相关材料研究部_刘建平团队
推荐引用方式
GB/T 7714
H. B. Wang,J. P. Liu,S. M. Zhang,et al. Thermal characterization of GaN-based laser diodes by forward-voltage method[J]. Journal of Applied Physics,2012,111(9):094513.
APA H. B. Wang,J. P. Liu,S. M. Zhang,&H. Yang.(2012).Thermal characterization of GaN-based laser diodes by forward-voltage method.Journal of Applied Physics,111(9),094513.
MLA H. B. Wang,et al."Thermal characterization of GaN-based laser diodes by forward-voltage method".Journal of Applied Physics 111.9(2012):094513.
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