Thermal characterization of GaN-based laser diodes by forward-voltage method | |
H. B. Wang(王怀兵); J. P. Liu(刘建平); S. M. Zhang(张书明); H. Yang(杨辉) | |
刊名 | Journal of Applied Physics |
2012-05-01 | |
卷号 | 111期号:9页码:094513 |
通讯作者 | M. X. Feng(冯美鑫) |
英文摘要 | An expression of the relation between junction temperature and forward voltage common for both GaN-based laser diodes (LDs) and light emitting diodes is derived. By the expression, the junction temperature of GaN-based LDs emitting at 405 nm was measured at different injection current and compared with the result of micro-Raman spectroscopy, showing that the expression is reasonable. In addition, the activation energy of Mg in AlGaN/GaN superlattice layers is obtained based on the temperature dependence of forward voltage. |
收录类别 | SCI |
语种 | 英语 |
WOS记录号 | WOS:000304109900147 |
公开日期 | 2013-01-16 |
内容类型 | 期刊论文 |
源URL | [http://58.210.77.100/handle/332007/915] |
专题 | 苏州纳米技术与纳米仿生研究所_纳米器件及相关材料研究部_刘建平团队 |
推荐引用方式 GB/T 7714 | H. B. Wang,J. P. Liu,S. M. Zhang,et al. Thermal characterization of GaN-based laser diodes by forward-voltage method[J]. Journal of Applied Physics,2012,111(9):094513. |
APA | H. B. Wang,J. P. Liu,S. M. Zhang,&H. Yang.(2012).Thermal characterization of GaN-based laser diodes by forward-voltage method.Journal of Applied Physics,111(9),094513. |
MLA | H. B. Wang,et al."Thermal characterization of GaN-based laser diodes by forward-voltage method".Journal of Applied Physics 111.9(2012):094513. |
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