Nano-oxide thin films deposited via atomic layer deposition on microchannel plates

	Nano-oxide thin films deposited via atomic layer deposition on microchannel plates
	Yan BJ(闫保军); Liu SL(刘术林); Heng YK(衡月昆); Yan, BJ; Liu, SL; Heng, YK
刊名	NANOSCALE RESEARCH LETTERS
	2015
卷号	10 页码:162
关键词	Microchannel plate (MCP) Atomic layer deposition (ALD) Thin film High aspect ratio Electrical performance
通讯作者	闫保军
英文摘要	Microchannel plate (MCP) as a key part is a kind of electron multiplied device applied in many scientific fields. Oxide thin films such as zinc oxide doped with aluminum oxide (ZnO: Al2O3) as conductive layer and pure aluminum oxide (Al2O3) as secondary electron emission (SEE) layer were prepared in the pores of MCP via atomic layer deposition (ALD) which is a method that can precisely control thin film thickness on a substrate with a high aspect ratio structure. In this paper, nano-oxide thin films ZnO: Al2O3 and Al2O3 were prepared onto varied kinds of substrates by ALD technique, and the morphology, element distribution, structure, and surface chemical states of samples were systematically investigated by scanning electron microscopy (SEM), energy-dispersive X-ray spectroscopy (EDS), X-ray diffraction (XRD), and X-ray photoemission spectroscopy (XPS), respectively. Finally, electrical properties of an MCP device as a function of nano-oxide thin film thickness were firstly studied, and the electrical measurement results showed that the average gain of MCP was greater than 2,000 at DC 800 V with nano-oxide thin film thickness approximately 122 nm. During electrical measurement, current jitter was observed, and possible reasons were preliminarily proposed to explain the observed experimental phenomenon.
学科主题	Science & Technology - Other Topics; Materials Science; Physics
类目[WOS]	Nanoscience & Nanotechnology ; Materials Science, Multidisciplinary ; Physics, Applied
收录类别	SCI ; EI ; CA
WOS记录号	WOS:000352704500001
公开日期	2016-05-03
内容类型	期刊论文
源URL	[http://ir.ihep.ac.cn/handle/311005/228346]
专题	中国科学院高能物理研究所
推荐引用方式 GB/T 7714	Yan BJ,Liu SL,Heng YK,et al. Nano-oxide thin films deposited via atomic layer deposition on microchannel plates[J]. NANOSCALE RESEARCH LETTERS,2015,10:162.
APA	闫保军,刘术林,衡月昆,Yan, BJ,Liu, SL,&Heng, YK.(2015).Nano-oxide thin films deposited via atomic layer deposition on microchannel plates.NANOSCALE RESEARCH LETTERS,10,162.
MLA	闫保军,et al."Nano-oxide thin films deposited via atomic layer deposition on microchannel plates".NANOSCALE RESEARCH LETTERS 10(2015):162.