Fabrication of GaN-based ridge waveguides with very smooth and vertical sidewalls by combined plasma dry etching and wet chemical etching

	Fabrication of GaN-based ridge waveguides with very smooth and vertical sidewalls by combined plasma dry etching and wet chemical etching
	Wanyong Li ; Yi Luo ; Bing Xiong ; Changzheng Sun ; Lai Wang ; Jian Wang ; Yanjun Han ; Jianchang Yan ; Tongbo Wei ; Hongxi Lu
刊名	physica status solidi a
	2015
卷号	212 期号:10 页码:2341–2344
学科主题	半导体器件
收录类别	SCI
语种	英语
公开日期	2016-04-15
内容类型	期刊论文
源URL	[http://ir.semi.ac.cn/handle/172111/27003]
专题	半导体研究所_中科院半导体照明研发中心
推荐引用方式 GB/T 7714	Wanyong Li,Yi Luo,Bing Xiong,et al. Fabrication of GaN-based ridge waveguides with very smooth and vertical sidewalls by combined plasma dry etching and wet chemical etching[J]. physica status solidi a,2015,212(10):2341–2344.
APA	Wanyong Li.,Yi Luo.,Bing Xiong.,Changzheng Sun.,Lai Wang.,...&Hongxi Lu.(2015).Fabrication of GaN-based ridge waveguides with very smooth and vertical sidewalls by combined plasma dry etching and wet chemical etching.physica status solidi a,212(10),2341–2344.
MLA	Wanyong Li,et al."Fabrication of GaN-based ridge waveguides with very smooth and vertical sidewalls by combined plasma dry etching and wet chemical etching".physica status solidi a 212.10(2015):2341–2344.