Optimization of Substrate Conformal Imprint Lithography (SCIL) and Etching for Nanostructure

	Optimization of Substrate Conformal Imprint Lithography (SCIL) and Etching for Nanostructure
	Zhaoxin Geng ; Xiangbin Guo ; Qiang Kan ; Hongda Chen
刊名	aip advances
	2015
卷号	5 期号:4 页码:9-11
学科主题	光电子学
收录类别	SCI
语种	英语
公开日期	2016-03-22
内容类型	期刊论文
源URL	[http://ir.semi.ac.cn/handle/172111/26667]
专题	半导体研究所_光电子研究发展中心
推荐引用方式 GB/T 7714	Zhaoxin Geng,Xiangbin Guo,Qiang Kan,et al. Optimization of Substrate Conformal Imprint Lithography (SCIL) and Etching for Nanostructure[J]. aip advances,2015,5(4):9-11.
APA	Zhaoxin Geng,Xiangbin Guo,Qiang Kan,&Hongda Chen.(2015).Optimization of Substrate Conformal Imprint Lithography (SCIL) and Etching for Nanostructure.aip advances,5(4),9-11.
MLA	Zhaoxin Geng,et al."Optimization of Substrate Conformal Imprint Lithography (SCIL) and Etching for Nanostructure".aip advances 5.4(2015):9-11.