Preparation of Silicon Nitride Hollow Quasi-Spheres by RF Thermal Plasma | |
Lu, Chen1,2; Fan, Junmei1![]() | |
刊名 | INTERNATIONAL JOURNAL OF APPLIED CERAMIC TECHNOLOGY
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2015-09-01 | |
卷号 | 12期号:5页码:939-948 |
ISSN号 | 1546-542X |
英文摘要 | Silicon nitride hollow quasi-spheres (SNHQSs) are prepared via a two-step method: producing micrometer-sized agglomerated granules with -Si3N4, and sintering additives of nano-alumina and nano-yttria by spray-drying and then hollowing the spray-dried granules (SDGs) by radio frequency thermal plasma sintering. Five kinds of slurry with different content of sintering additives are prepared for spray-drying, and the attained five kinds of SDGs have similar morphology and properties. However, different SDGs generate diverse hollow structures via plasma sintering. The cavity formation mechanism of the SNHQSs is deeply investigated. In addition, the obtained SNHQSs possess low apparent density (0.371-0.481g/mL), high compressive strength (up to 50MPa), and good thermal stability (up to 1600 degrees C), which will enable their promising applications in porous ceramics. |
WOS标题词 | Science & Technology ; Technology |
类目[WOS] | Materials Science, Ceramics |
研究领域[WOS] | Materials Science |
关键词[WOS] | MECHANICAL-PROPERTIES ; POWDERS ; PARTICLES ; SPHEROIDIZATION ; BETA-SI3N4 ; CERAMICS ; YTTRIA ; FLOW |
收录类别 | SCI |
语种 | 英语 |
WOS记录号 | WOS:000360979200004 |
内容类型 | 期刊论文 |
源URL | [http://ir.ipe.ac.cn/handle/122111/19533] ![]() |
专题 | 过程工程研究所_多相复杂系统国家重点实验室 |
作者单位 | 1.Chinese Acad Sci, Inst Proc Engn, State Key Lab Multiphase Complex Syst, Beijing 100190, Peoples R China 2.Univ Chinese Acad Sci, Beijing 100190, Peoples R China 3.Chinese Acad Sci, Fujian Inst Res Struct Matter, State Key Lab Struct Chem, Beijing 100190, Peoples R China |
推荐引用方式 GB/T 7714 | Lu, Chen,Fan, Junmei,Zhang, Yanchang,et al. Preparation of Silicon Nitride Hollow Quasi-Spheres by RF Thermal Plasma[J]. INTERNATIONAL JOURNAL OF APPLIED CERAMIC TECHNOLOGY,2015,12(5):939-948. |
APA | Lu, Chen,Fan, Junmei,Zhang, Yanchang,Yuan, Fangli,&Yao, Mingshui.(2015).Preparation of Silicon Nitride Hollow Quasi-Spheres by RF Thermal Plasma.INTERNATIONAL JOURNAL OF APPLIED CERAMIC TECHNOLOGY,12(5),939-948. |
MLA | Lu, Chen,et al."Preparation of Silicon Nitride Hollow Quasi-Spheres by RF Thermal Plasma".INTERNATIONAL JOURNAL OF APPLIED CERAMIC TECHNOLOGY 12.5(2015):939-948. |
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