Preparation of Silicon Nitride Hollow Quasi-Spheres by RF Thermal Plasma
Lu, Chen1,2; Fan, Junmei1; Zhang, Yanchang1; Yuan, Fangli1; Yao, Mingshui3
刊名INTERNATIONAL JOURNAL OF APPLIED CERAMIC TECHNOLOGY
2015-09-01
卷号12期号:5页码:939-948
ISSN号1546-542X
英文摘要

Silicon nitride hollow quasi-spheres (SNHQSs) are prepared via a two-step method: producing micrometer-sized agglomerated granules with -Si3N4, and sintering additives of nano-alumina and nano-yttria by spray-drying and then hollowing the spray-dried granules (SDGs) by radio frequency thermal plasma sintering. Five kinds of slurry with different content of sintering additives are prepared for spray-drying, and the attained five kinds of SDGs have similar morphology and properties. However, different SDGs generate diverse hollow structures via plasma sintering. The cavity formation mechanism of the SNHQSs is deeply investigated. In addition, the obtained SNHQSs possess low apparent density (0.371-0.481g/mL), high compressive strength (up to 50MPa), and good thermal stability (up to 1600 degrees C), which will enable their promising applications in porous ceramics.

WOS标题词Science & Technology ; Technology
类目[WOS]Materials Science, Ceramics
研究领域[WOS]Materials Science
关键词[WOS]MECHANICAL-PROPERTIES ; POWDERS ; PARTICLES ; SPHEROIDIZATION ; BETA-SI3N4 ; CERAMICS ; YTTRIA ; FLOW
收录类别SCI
语种英语
WOS记录号WOS:000360979200004
内容类型期刊论文
源URL[http://ir.ipe.ac.cn/handle/122111/19533]  
专题过程工程研究所_多相复杂系统国家重点实验室
作者单位1.Chinese Acad Sci, Inst Proc Engn, State Key Lab Multiphase Complex Syst, Beijing 100190, Peoples R China
2.Univ Chinese Acad Sci, Beijing 100190, Peoples R China
3.Chinese Acad Sci, Fujian Inst Res Struct Matter, State Key Lab Struct Chem, Beijing 100190, Peoples R China
推荐引用方式
GB/T 7714
Lu, Chen,Fan, Junmei,Zhang, Yanchang,et al. Preparation of Silicon Nitride Hollow Quasi-Spheres by RF Thermal Plasma[J]. INTERNATIONAL JOURNAL OF APPLIED CERAMIC TECHNOLOGY,2015,12(5):939-948.
APA Lu, Chen,Fan, Junmei,Zhang, Yanchang,Yuan, Fangli,&Yao, Mingshui.(2015).Preparation of Silicon Nitride Hollow Quasi-Spheres by RF Thermal Plasma.INTERNATIONAL JOURNAL OF APPLIED CERAMIC TECHNOLOGY,12(5),939-948.
MLA Lu, Chen,et al."Preparation of Silicon Nitride Hollow Quasi-Spheres by RF Thermal Plasma".INTERNATIONAL JOURNAL OF APPLIED CERAMIC TECHNOLOGY 12.5(2015):939-948.
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