题名基于平板超透镜的亚波长成像与光刻研究
作者余慕欣
学位类别博士
答辩日期2015-05
授予单位中国科学院大学
导师吴一辉
关键词衍射极限 表面等离子体 亚波长成像 光刻技术
其他题名Studies on the Tunable Sub-wavelength Imaging and Nanolithography Based on Planar Superlens
学位专业机械制造及其自动化
中文摘要正折射率空间扮演了一个低通滤波器的角色,高空间频率信息在其内传输受到抑制。由于空间高频信息的缺失,光学成像系统的分辨率受衍射极限限制,分辨率约为照明波长的二分之一。近年来,表面等离子体激元表现出亚波长传输、近场电场增强和模式体积小等新颖光学特性受到广泛关注。基于表面等离子体耦合传输实现超衍射成像和光刻已经发展成为一个重要的研究方向。本论文以实现器件可调谐为出发点,开展了亚波长成像和基于MIM结构表面等离子体激元干涉光刻技术的研究。 1. 建立了实现亚波长成像的金属/介质平板结构的理论模型,分析了传统超透镜工作波长受限的物理机制;在此基础上,研究了介质薄膜对SP模式的调制机理,实现SPR波长从紫外到可见频率区间的连续可调;给出了Pode绘图原理下OTF和SP模式之间的简单对应关系。 2. 提出了一种工作于可见光波段,工作波长连续可调谐的超透镜。通过分析介质薄膜对表面等离子体模式的调制,给出了超透镜的亚波长成像规律。研究结果表明,通过调节透镜介质薄膜的厚度可实现波长从375~515 nm、分辨率优于λ/6、高能量透过率的亚波长成像。该超透镜结构简单,可有效地减小制备误差及表面粗糙度对亚波长成像的不利影响,降低了制造难度。该器件适用于成像、光刻及高密度数据存储等方向。 3. 研究了一种基于MIM结构表面等离子体干涉的亚波长光刻技术。相比于传统开放式表面等离子体干涉技术,该结构利用表面等离子体腔模共振有效地提 高了光刻分辨率和曝光深度,在照明波长550 nm下实现光刻分辨率22 nm(λ/25)。
英文摘要The Positive refraction space acts as a low-pass filter, which allows low-space-frequency waves transmitting but restrains the high-space frequency waves. The resolution limitation of the traditional optical imaging system is ascribed to the loss of evanescent information. In recent years, the novel characters of surface plasmon polaritons, such as sub-wavelength transmission, sub-wavelength mode volume and local field enhancement, attract more and more attentions. The sub-wavelength imaging using the coupling and transmitting of SPPs has been developed to be an important research field. In this thesis, we mainly focus on theoretical research on tuning the work-wavelength of sub-diffractive-limited imaging and the resolution of nanolithography. 1. The theoretical model of planar metal/dielectric film for sub-wavelength imaging is built, and the limitation of the work-wavelength of traditional superlens is interpreted via mode analysis; the SP mode tuning capability of ultra thin dielectric layers is studied, which shows that with the aid of the dielectric layers, the SPR wavelength can be tuned from ultraviolet to visible range; a simple relationship between OTF and SP modes is demonstrated base on Pode plot theory. 2. A superlens which can work at visible wavelength and whose wor wavelength can be manipulated is proposed. The relationship between the dielectric layer and the SPPs is analyzed, and its sub-wavelength imaging law is given. The results show that a sub-wavelength imaging with high transmittance and resolution of λ/6 can be obtained in the range of 375~515 nm. The fabrication tolerance and surface roughness can be greatly reduced, ascribed to its quite simple structure. The designed structure can be used in sub-diffractive-limited lithography, imaging, and high intensity storage. 3. A surface plasmon interference nanolithography technique based on MIM structure is studied. The resolution of the nanolithography can be tuned by changing the illumination wavelength or the thickness of the dielectric layer under the condition of keeping the mask the same. Attributed to the surface plasmon cavity resonance, the resolution and exposure depth can be greatly improved compared with traditional SPIN technique. At the wavelength of 550 nm, a resolution of 22 nm (about λ/25) is achieved.
公开日期2015-12-24
内容类型学位论文
源URL[http://ir.ciomp.ac.cn/handle/181722/48946]  
专题长春光学精密机械与物理研究所_中科院长春光机所知识产出
推荐引用方式
GB/T 7714
余慕欣. 基于平板超透镜的亚波长成像与光刻研究[D]. 中国科学院大学. 2015.
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