QQ客服 官方微博 反馈留言

题名	磁流变抛光液的研制及去除函数稳定性研究
作者	白杨
学位类别	博士
答辩日期	2015-05
授予单位	中国科学院大学
导师	张峰
关键词	磁流变抛光 去除函数 磁流变抛光液 稳定性 非球面
其他题名	Preparation of MR polishing fluid and study on the stability of removal function
学位专业	光学工程
中文摘要	随着科学技术的发展，现代光学系统对光学元件的面形精度和表面质量提出了更高的要求，尤其是高精度非球面镜的应用越来越广泛。一直以来非球面镜的制造技术是光学制造的难点和热点。由于传统的加工方法在加工过程中存在磨头老化、磨头与工件的吻合差、去除函数不稳定等缺点，造成加工过程不易控制，加工效率较低，很难获得高精度非球面。磁流变抛光技术作为新一代高确定性光学加工技术，可以克服传统加工这些缺点，是非球面加工理想手段。 磁流变抛光技术实现高效率确定性加工的关键在于确保加工过程中去除函数的高效和稳定性。去除函数的高效的稳定性主要取决于三方面因素，一是磁流变抛光液的性能；二是循环控制系统的稳定性和准确性；三是加工参数选择的合理性。因此，本文围绕这三方面进行了深入研究，并利用研究成果对一块非球面镜进行了实际加工。 本文主要研究内容： 1. 高性能磁流变抛光液的研制及性能测试 通过对固体颗粒分散机理的研究，结合实际光学加工的需求，研制了性能优良的磁流变抛光液，提出了磁流变抛光液的配制流程，建立磁流变抛光液性能检测平台，并利用检测设备对液体的零磁场粘度、分散特性、流变特性进行了检测，验证所配制磁流变抛光液具有较低的零磁场粘度、良好抗沉降性和流变性，满足抛光需求。最后，对磁流变抛光液的性能进行优化，将磁流变抛光液配制成絮凝体系，提高了抛光液的去除效率并获得了形状理想的去除函数。 2. 磁流变抛光循环控制系统及其对去除函数的影响 讨论了几种结构形式磁流变抛光设备的优缺点，基于自主研发的倒置式磁流变抛光设备，结合实际加工中对液体控制和加工后液体的清理等方面要求，构建了磁流变抛光的液体循环和成分控制系统。系统通过检测循环光路中沿程压实现对抛光过程中液体粘度的实时监控，并对液体成分进行实时补给，通过冷却水循环控制液体温度。同时，研究了抛光过程中温度和粘度变化对抛光液流量和去除函数的影响。最后，利用去除函数稳定性实验验证了磁流变抛光液的抛光稳定性和循环控制系统的准确可靠性。 3. 主要工艺参数对工件受力和去除函数的影响 选择了两种工程中常用的材料BK7玻璃和RB-SiC，通过KISTLER力传感器研究了主要工艺参数变化了对加工过程中工件所受力的影响，同时分析了工艺参数变化对去除函数的影响，并比较了几种参数变化对加工两种材料影响的异同。最后，研究了正压力和压强以及剪切力和剪切应力与材料去除效率的关系。 4. 非球面的实际加工 研究了应用磁流变抛光RB-SiC的材料去除机理，并分析了抛光后表面粗糙度。利用自主研制的磁流变抛光液和抛光设备对一块非球面RB-SiC反射镜进行了实际加工，加工后满足了改性前的面形和表面粗糙度的要求。研制了适用于硅改性层抛光的磁流变抛光液，分析了抛光粉含量的变化对去除函数的影响。通过去选择去除效率高和去除效率较低的两种抛光液，对硅改性后的表面进行了抛光，抛光后面形精度（RMS）达到λ/50(λ=632.8nm)。 本文对磁流变抛光液体的配制和影响去除函数稳定性有关因素进行了深入研究。针对实际工程中常用材料，分别研制性能优良的水基磁流变抛光液，并建立了磁流变抛光液的循环控制系统，保证加工过程中去除函数稳定。分析了主要工艺参数对去除函数的影响，通过选择合理的工艺参数，获得高效稳定的去除函数，并成功应用于非球面光学元件的实际加工，取得了理想效果。
英文摘要	With the development of science and technology, modern optical systems make a higher demand for surface accuracy and surface quality optics. The high-precision aspheric mirrors are especially used more and more widely. The manufacturing technology of aspheric mirrors is always the difficult and hot issue. Because traditional processing methods exist pad aging, mismatch of workpiece-lap, removal function instability and other shortcomings which result in the process uncontrolled, lower processing efficiency. It is difficult to obtain high-precision aspheric mirrors. As a new generation of high deterministic optical processing technology, magnetorheological finishing (MRF) can overcome the shortcomings of traditional processing and become the ideal method for aspheric manufacture. The key factor to achieve high efficiency and deterministic MRF is to ensure the efficient and stability of removal function in manufacture process. Efficient and stability removal function depends on three factors. Firstly is the performance of magnetorheological polishing fluid, secondly is the stability and accuracy of the loop control system; thirdly is the rationality of processing parameter selection. Therefore, this paper carried deeply study on these three aspects and applied of research results to the actual processing of an aspheric mirror. The main contents of this article: 1. High performance MR polishing fluid development and testing. Through the study of the mechanism of solid particles dispersion and combining with the needs of the actual optical processing, we developed the excellent performance MR polishing fluid, proposed MR polishing fluid preparation process and established the MR fluid performance testing platform. The off-field viscosity, dispersion properties and rheological properties of MR polishing fluid are tested with the testing equipment. The results show that the prepared MR polishing fluid possesses low off-field viscosity, good anti-settling property and rheology property which meet the demand of polishing. Finally, the material removal rate and shape are improved by preparing MR polishing fluid as a flocculation system in dispersion. 2. MRF circulatory system and its impact on the removal function The advantages and disadvantages of several structural forms of MRF equipment are discussed. We develop MR polishing fluid circulatory system based on the inverted form MRF equipment developed by ourselves, combining with requirement of fluid composition control in actual polishing and fluid clean up after finishing. The circulatory system monitors the viscosity of MR polishing fluid by test the pressure along the channel of circulatory system and supply the fluid in real time. The temperature of MR polishing fluid is controlled by cooling water system. The influences of temperature and viscosity changes on flow and removal function are also studied. Finally, the precision and reliability of circulatory system and the stability of prepared MR polishing fluid are verified by the removal function stability experiment. 3. The influences of main process parameters on the force in process and removal function in manufacture process The influences of main process parameters changes on the force in manufacture process are studied by using KISTLER force sensor by selecting two kinds of common used material BK7 and RB-SiC. The influences of the changes on removal function are also studied. The similarities and differences of influences are compared between processing two kinds of material. Finally, the relationship between normal force, pressure, shear force, shear stress and material removal rate are studied. 4. The actual machining aspheric The removal mechanism of MRF on RB-SiC material and roughness after polishing are studied. An aspheric RB-SiC reflective mirror is manufactured with self-developed MR polishing fluid and apparatus. The surface accuracy and roughness meet the surface requirement before modification. A kind of MR polishing fluid suitable for polishing silicon modified layer was developed. The influence abrasive concentration change in MR polishing fluid on removal function is also studied. The silicon modified of aspheric RB-SiC reflective mirror is polished by using two kind of MR polishing fluid with high material removal rate and low material removal rate. After polishing the surface accuracy reaches λ/50(λ=632.8nm). In this paper, the preparation of MR polishing fluid and the factors that influence the stability of removal function are deeply studied. Few kinds of MR polishing fluid are developed respectively for the material commonly used in optical engineering. MRF circulatory system is established based on self-developed polishing apparatus to control ensure the removal function stability of during polishing. The influences of main process parameters on removal function are analyzed. The efficient and stable removal function obtained by select reasonable process parameters which are applied to actual aspheric element manufacture successfully and desirable result achieved.
公开日期	2015-12-24
内容类型	学位论文
源URL	[http://ir.ciomp.ac.cn/handle/181722/48823]
专题	长春光学精密机械与物理研究所_中科院长春光机所知识产出
推荐引用方式 GB/T 7714	白杨. 磁流变抛光液的研制及去除函数稳定性研究[D]. 中国科学院大学. 2015.

个性服务

查看访问统计

相关权益政策

暂无数据

收藏/分享

除非特别说明，本系统中所有内容都受版权保护，并保留所有权利。