Influence of the incident flux angles on the structures and properties of magnetron sputtered MoS2 films

CORC > 兰州化学物理研究所 > 中国科学院兰州化学物理研究所 > 固体润滑国家重点实验室

	Influence of the incident flux angles on the structures and properties of magnetron sputtered MoS2 films
	Qiao L(乔丽); Wang P(王鹏); Chai LQ(柴利强); Zhang XL(张小龙); Liu WM(刘维民); Wang P(王鹏)
刊名	Journal of Physics D: Applied Physics
	2015
卷号	48 期号:17 页码:175304(1-8)
关键词	MoS2 films oblique angle deposition surface tribology magnetron sputtering
ISSN号	0022-3727
通讯作者	王鹏
英文摘要	In this study, by adjusting the angle between the incident flux and the normal direction of the substrate's surface, the MoS₂ film prepared by magnetron sputtering was used as a model system to study the influence of incident flux angles on the structures and properties of deposited films. The morphological and structural evolutions of MoS₂ films deposited at different angles ranging from 0 to 85 degrees were characterized and the corresponding mechanical and tribological properties were evaluated. The results show that a conversion of a continuous film structure to a separate columnar structure with high porosity is found as the incident flux angle increases. Although changing the incident flux angle plays a negligible effect on the crystal preferential orientation of deposited MoS₂ films, the mechanical and tribological properties of these films degrade dramatically when the incident flux angle is larger than 60 degrees.
学科主题	材料科学与物理化学
收录类别	SCI
资助信息	the National Natural Science Foundation of China (Grant No: 51227804;11475236)
语种	英语
WOS记录号	WOS:000353329800015
内容类型	期刊论文
源URL	[http://210.77.64.217/handle/362003/18423]
专题	兰州化学物理研究所_固体润滑国家重点实验室
通讯作者	Wang P(王鹏)
作者单位	Chinese Acad Sci, Lanzhou Inst Chem Phys, State Key Lab Solid Lubricat, Lanzhou 730000, Peoples R China
推荐引用方式 GB/T 7714	Qiao L,Wang P,Chai LQ,et al. Influence of the incident flux angles on the structures and properties of magnetron sputtered MoS2 films[J]. Journal of Physics D: Applied Physics,2015,48(17):175304(1-8).
APA	Qiao L,Wang P,Chai LQ,Zhang XL,Liu WM,&王鹏.(2015).Influence of the incident flux angles on the structures and properties of magnetron sputtered MoS2 films.Journal of Physics D: Applied Physics,48(17),175304(1-8).
MLA	Qiao L,et al."Influence of the incident flux angles on the structures and properties of magnetron sputtered MoS2 films".Journal of Physics D: Applied Physics 48.17(2015):175304(1-8).