Low temperature magnetron sputtering deposition of hydrogenated microcrystalline silicon thin films without amorphous incubation layers on glass

CORC > 兰州化学物理研究所 > 中国科学院兰州化学物理研究所 > 先进润滑与防护材料研究发展中心

	Low temperature magnetron sputtering deposition of hydrogenated microcrystalline silicon thin films without amorphous incubation layers on glass
	Wang, Linqing 1,4; Wang, Weiyan 2; Huang, Jinhua 2; Zeng, Yuheng 2; Tan, Ruiqin 3; Song, Weijie 2; Chen JM(陈建敏)1
刊名	Journal of Non-Crystalline Solids
	2014
卷号	388 页码:86-90
关键词	mu c-Si:H thin films Magnetron sputtering Amorphous incubation layers Low temperature
ISSN号	0022-3093
通讯作者	陈建敏
英文摘要	Hydrogenated microcrystalline silicon (mu c-Si:H) thin films were deposited on glass by magnetron sputtering at the substrate temperature of 100 degrees C and the hydrogen dilution ratio of 65%. The crystallinity and microstructure of thin films were systematically studied using Raman spectroscopy, X-ray diffraction (XRD), transmission electron microscopy (TEM), and Fourier transform infrared spectroscopy (FT-IR). The results showed that the mu c-Si:H thin film was amorphous and hydrogen-rich at the initial stage of the growth. This amorphous layer was crystallized during further growth. The crystallinity of thin films is not almost changed with the increase of thickness when the thickness of thin film exceeds 70 nm. Finally, the mu c-Si:H thin film without amorphous incubation layer was obtained. The possible growth mechanism of fabricating mu c-Si:H thin films without amorphous incubation layers was also discussed.
学科主题	材料科学与物理化学
收录类别	SCI
资助信息	the National Natural Science Foundation of China (Grant No. 61106096);the ZHejiang Provincial Natural Science Foundation of China (Grant No. LY12E02009);the Ningbo Natural Science Foundation (Grant No. 2012A610120)
语种	英语
WOS记录号	WOS:000333853900013
内容类型	期刊论文
源URL	[http://210.77.64.217/handle/362003/18298]
专题	兰州化学物理研究所_先进润滑与防护材料研究发展中心兰州化学物理研究所_固体润滑国家重点实验室
作者单位	1.Chinese Acad Sci, Lanzhou Inst Chem Phys, State Key Lab Solid Lubricat, Lanzhou 730000, Peoples R China 2.Chinese Acad Sci, Ningbo Inst Mat Technol & Engn, Ningbo 315201, Zhejiang, Peoples R China 3.Ningbo Univ, Fac Informat Sci & Engn, Ningbo 315211, Zhejiang, Peoples R China 4.Univ Chinese Acad Sci, Beijing 100049, Peoples R China
推荐引用方式 GB/T 7714	Wang, Linqing,Wang, Weiyan,Huang, Jinhua,et al. Low temperature magnetron sputtering deposition of hydrogenated microcrystalline silicon thin films without amorphous incubation layers on glass[J]. Journal of Non-Crystalline Solids,2014,388:86-90.
APA	Wang, Linqing.,Wang, Weiyan.,Huang, Jinhua.,Zeng, Yuheng.,Tan, Ruiqin.,...&Chen JM.(2014).Low temperature magnetron sputtering deposition of hydrogenated microcrystalline silicon thin films without amorphous incubation layers on glass.Journal of Non-Crystalline Solids,388,86-90.
MLA	Wang, Linqing,et al."Low temperature magnetron sputtering deposition of hydrogenated microcrystalline silicon thin films without amorphous incubation layers on glass".Journal of Non-Crystalline Solids 388(2014):86-90.